Target Laboratory

  1. Home
  2. Support
  3. Scientific Division
  4. Target Laboratory
Photo Gallery Team Collaborators Publications
Target Laboratory ELI-NP

Embedded within the ELI-NP support complex, the Target Laboratory extends over 270 m2 of ISO 6 and ISO 7 cleanroom-environment. This particular Lab is dedicated to the development, fabrication, characterization and micro-assembly of targets for experiments with high-power lasers and gamma beams.
Accommodating a wide range of state-of-the-art equipment and a specialized team of materials scientists and engineers, the Target Laboratory is set up to address demands for targets and provide support throughout the entire process, from proposal evaluation, to technical feasibility and finally target delivery. On top of that, it also performs Research and Development activities in order to continuously develop and upgrade novel target designs.

Main Activities

Design, fabrication, characterization, patterning and micro-assembly of a broad range of solid targets
Optimization of target key-parameters, custom-made possibilities and last-moment modifications and adjustments of the targets, thorough characterization of targets just before the shot
Develop targets with advanced configurations and tailored properties
Solid films deposition (thickness from few nm up to few microns, and lateral dimensions of few microns up to few mm)
Surface structuring and cleaning (micro/nano-structuring), characterization of targets, microfabrication and assembly of the targets
In-house development of the manufacturing processes, with a particular focus towards quality, their reproducibility and optimization of the process parameters

Equipment

UHV sputter deposition cluster
UHV e-beam deposition
Reactive Ion Etching (RIE) system
Optical lithography units (mask aligner, hot plates, coater)
X-ray Diffractometer (XRD)
Scanning Electron Microscope (SEM)
Atomic Force Microscopy (AFM)
Optical profilometer
Optical microscope
Calcination and tubular ovens
Chemistry equipment
Cutting machine
Lapping/polishing machine
Optical tables, breadboards, supports
Benchtop plasma treatment systems

Topics

Fabrication and characterization of nano-structured targets with patterned front-side: gratings, ordered array of metallic nanowires, micro-spheres, nano-particles
Fabrication and characterization of free-standing films as targets or as supports for reduced-mass targets, and multi-layered targets development for multi-energetic, multi-component ions generation for radiobiological studies

Target Laboratory - research and development for target material for research with laser and gamma

The most complex laboratory in the division, the target laboratory has a strong research component related to the development of special materials used as targets in experiments.

The manufacturing process starts after establishing the procedure in correlation with the research process. The target laboratory, currently encompassing 270 m2 area of cleanroom-environment (ISO 6 and ISO 7), is dedicated to the development, fabrication, characterization and micro-assembly of targets for experiments with high power lasers and gamma beams. Accommodating a wide range of state-of-the-art equipment and a specialized team of materials scientists and engineers, the target laboratory is set up to address the demands for targets, provide support throughout the entire process: from proposal evaluation of the target to technical feasibility to target delivery; and to perform R&D activities in order to continuously develop and upgrade novel target designs. In-house production of targets (within ELI-NP’s Target Laboratory) results in benefits such as avoiding the damage of fragile targets (which usually occurs during transportation), meeting specific target requirements in terms of chemical stability and purity, ongoing optimization of target key-parameters, custom-made possibilities and last-moment modifications and adjustments of the targets, through characterization of targets just before the shot, but also, in the long run, and additionally reduced manufacturing costs due to in-house development of technologies and methodologies.

Photo Gallery

Scanning Electron Microscope (SEM)

Scanning Electron Microscope (SEM) with EDS/EBSD/EBL

Scanning Electron Microscope for microstructural and morphological studies on samples up to 6 inch; 1nm resolution.

White Light Interferometer

Scanning Electron Microscope (SEM) with EDS/EBSD/EBL

Equipped with EBL unit (electron beam lithography), Peltier unit for bio samples; C and metal table-top coating units; mechanical grinder for sample preparation.

Scanning Electron Microscope (SEM)

Scanning Electron Microscope detectors

Using several detectors: SE (Secondary Electrons), BSE (Backscattered Electrons), STEM (Scanning Transmission Electron Microscopy), EBSD (Electron Backscatter Diffraction) and EDS (energy diffraction spectroscopy)

Optical Microscope

Dedicated microscope for optical lithography process; image modes: brightfield, darkfield, simple polarization, differential interface contrast (DIC), epi-fluorescence (UV 365 nm).

Servicing/Maintenance of equipment

Servicing/Maintenance of equipment

Optical lithography unit - Mask Aligner

Optical lithography unit - mask aligner

For wafers up to 8 inch in diameter; lateral resolution down to 500 nm.

Optical lithography units - hot plates, coater

Optical lithography units - hot plates, coater

Spin Coater

Ultra-high Vacuum Deposition Systems

Ultra-high Vacuum Deposition Systems

UHV deposition system for thin film growth via RF/DC sputtering of oxides, nitrides, metals, multilayers; nanoparticle fabrication by sputtering; Ar-ion milling for optical lithography processes and and nano-particle deposition. Deposition at temperatures up to 1000oC (oxides, nitrides) or 850oC (metals), on wafers up to 6 inch in diameter.

Ultra-high Vacuum Deposition Cluster

Ultra-high Vacuum Deposition Cluster controller racks

Plasma in deposition chamber

Plasma in deposition chamber

Electron Beam Evaporation Deposition Systems

Electron Beam Evaporation Deposition Systems

Sample observation through viewports

Electron Beam Evaporation Deposition Systems

Electron Beam Evaporation Deposition Systems

UHV e-beam deposition system by e-beam evaporation of metals for growth of high purity metals; deposition temperature up to 850oC, wafers up to 6 inch in diameter.

Optical Profilometer

Optical Profilometer

Optical profilometer for surface morphology and profilometry, with 0.16 <µm XY resolution, and 0.1 nm Z resolution; 2D/3D images.

Reactive Ion Etching (RIE) system

Reactive Ion Etching (RIE) system

RIE system for Bosch and cryo reactive ion etching processes of wafers up to 8 inch in diameter; for optical lithography processes.

Analytical Balance

Analytical Balance

Analytical Balance

Cutting machine

Precise wet abrasive cutting machine, 3 automatic axes

Calcination oven

Calcination oven

Ovens for thermal treatments at temperatures up to 1300oC, under controllable atmosphere (O2, N2, O2+N2, Ar)

Atomic Force Microscope (AFM)

Atomic Force Microscope (AFM)

Atomic Force Microscope for morphological studies on samples up to 4” under air or controllable atmosphere.

Electrochemical set-up

Electrochemical set-up

Electrochemical set-up

Electrochemical set-up

X-ray Diffractometer (XRD)

X-ray Diffractometer (XRD)

X-Ray Diffraction system for microstructural characterization of materials, x-ray reflectivity, SAXS and USAXS, micro focus, in-plane and out of-plane (thin and thick film; bulk; nanoparticles; bio samples).

X-ray Diffractometer (XRD)

X-ray Diffractometer (XRD)

Targets and frames preparation

Targets and frames preparation

Metal coating unit

Metal coating unit

Ultrasound bath

Ultrasound bath

Safety cabinets

Safety cabinets

For storage of solvents, acids and bases.

Ultra-pure/DI water system

Ultra-pure/DI water system

Table-top coating units

Table-top coating units

Table-top coating units

Ovens

Table-top coating units

Chemical lab equipment

Analytical balances, pH-meters, stirring plates, heating mantles

Table-top coating units

Benchtop plasma treatment system

Team

Name Position Info
Victor LECA Senior Researcher CV     Info
Cristina GHEORGHIU Junior Researcher
Krishnan RAJAGOPALAN Junior Researcher
Iulia ZAI Engineer
Ștefania IONESCU Chemical Engineer
Laurențiu DINCĂ PhD Student
Daniel POPA Technician


Former group members

Valentin CRĂCIUN
Aurelia IONESCU
Vladimir ENE
Ionela ILIESCU
Marcel CONDE

Collaborators

The Target Laboratory works closely with several national and international institutes, like: Center for Advanced Laser Technologies (CETAL), Laser and Plasma Physics - Heinrich Heine University (Duesseldorf, Germany), Center for Light-Matter Interaction, Sensors & Analytics (LISA+, Tübingen, Germany), National Institute for Research and Development in Microtechnologies (IMT), National Institute for Laser Plasma & Radiation Physics (INFLPR), National Institute of Materials Physics (IFTM), Faculty of Physics (University of Bucharest), University “Politehnica” of Bucharest (UPB) along with the access at their capabilities for low-density material synthesis (organic and inorganic foams, including carbon-based foam), advanced 3D structures expertise, and complementary characterization analysis.

Feasible collaboration with industry:
a) Due to equipment specifications:

  • large wafers (size up to 6 - 8 inch)
  • semiconductors microfabrication (designated technology for complex integrated circuits, printed circuit boards ...)
  • superior quality, purity, reproducibility and reliability
  • broad panel capabilities for fabrication and characterization
  • unique capabilities (custom-made deposition)
  • R&D customize solutions for customers
  • open access platforms
b) Controlled environment, cleanroom areas (ISO 6 (1.000) and 7 (10.000) cleanliness; surface area 270 m2).
c) High interest shared research themes: micro- and nanotechnology, micro- and nano-optics, Si-based technology.

Publications, Abstracts, and Conference Presentations

Laser driven nuclear physics at ELI-NP

F. Negoita, M. Roth, P.G. Thirolf, S. Tudisco, F. Hannachi, S. Moustaizis, I. Pomerantz, P. Mckenna, J. Fuchs, K. Sphor, G. Acbas, A. Anzalone, P. Audebert, S. Balascuta, F. Cappuzzello, M.O. Cernaianu, S. Chen, I. Dancus, R. Freeman, H. Geissel, P. Ghenuche, L. Gizzi, F. Gobet, G. Gosselin, M. Gugiu, D. Higginson, E. dHumieres, C. Ivan, D. Jaroszynski, S. Kar, L. Lamia, V. Leca, L. Neagu, G. Lanzalone, V. Meot, S.R. Mirfayzi, I.O. Mitu, P. Morel, C. Murphy, C. Petcu, H. Petrascu, C. Petrone, P. Raczka, M. Risca, F. Rotaru, J.J. Santos, D. Schumacher, D. Stutman, M. Tarisien, M. Tataru, B. Tatulea, I.C.E. Turcu, M. Versteegen, D. Ursescu, S. Gales, N.V. Zamfir
Romanian Reports in Physics 68, Supplement, S37–S144 (2016)


Publications in collaboration with ELI-NP Positron Laboratory

Contact Us

Secretary

office.sdeli-np.ro

© Copyright 2020. ELI-NP. All Rights Reserved.

The content of this document does not necessarily represent the official position of the European Union or of the Government of Romania. For detailed information regarding the other programmes co-financed by the European Union please visit: www.fonduri-ue.ro